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Electron and hole components of tunneling currents through an interfacial oxide-high- k gate stack in metal-oxide-semiconductor capacitors
Noor F.A.a, Abdullah M.a, Sukirnoa, Khairurrijala, Ohta A.b, Miyazaki S.b,c
a Physics of Electronic Materials Research Division, Faculty of Mathematics and Natural Sciences, Institut Teknologi Bandung, Indonesia
b Graduate School of Advanced Sciences of Matter, Hiroshima University, Japan
c Department of Electronics, Nagoya University, Japan
[vc_row][vc_column][vc_row_inner][vc_column_inner][vc_separator css=”.vc_custom_1624529070653{padding-top: 30px !important;padding-bottom: 30px !important;}”][/vc_column_inner][/vc_row_inner][vc_row_inner layout=”boxed”][vc_column_inner width=”3/4″ css=”.vc_custom_1624695412187{border-right-width: 1px !important;border-right-color: #dddddd !important;border-right-style: solid !important;border-radius: 1px !important;}”][vc_empty_space][megatron_heading title=”Abstract” size=”size-sm” text_align=”text-left”][vc_column_text]Two different components of tunneling current in the TiN/HfSiOx N/SiO2 /p-Si (100) metal-oxide-semiconductor capacitor have been presented. The tunneling currents were calculated by taking into account a longitudinal-transverse kinetic energy coupling. The calculated tunneling currents were compared with that measured ones by employing the electron and hole effective masses and phase velocities as fitting parameters. It has been shown that hole tunneling currents dominate at low voltages whereas at high voltages the tunneling currents are mainly contributed by electrons. It has also been found that the effective mass of hole in the HfSiOx N layer is higher than that of electron. The gate electron and substrate hole velocities are 1× 105 m/s independent of the HfSiOx N thickness. In addition, it is speculated that the electron and hole effective masses in the HfSiOx N layer perhaps increase as its thickness decreases. © 2010 American Institute of Physics.[/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Author keywords” size=”size-sm” text_align=”text-left”][vc_column_text]Effective mass,Energy couplings,Fitting parameters,High voltage,High-K gate stacks,Hole effective mass,Hole tunneling,Interfacial oxides,Low voltages,Metal-oxide-semiconductor capacitors,Si(1 0 0),Tunneling current[/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Indexed keywords” size=”size-sm” text_align=”text-left”][vc_column_text][/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Funding details” size=”size-sm” text_align=”text-left”][vc_column_text][/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”DOI” size=”size-sm” text_align=”text-left”][vc_column_text]https://doi.org/10.1063/1.3503457[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text]Widget Plumx[/vc_column_text][/vc_column_inner][/vc_row_inner][/vc_column][/vc_row][vc_row][vc_column][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][/vc_column][/vc_row]