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Modeling of electron transmittance and tunneling current through an interfacial oxide-high-k-gate-stack by including transverse-longitudinal kinetic energy coupling and anisotropic masses: Effects of metal work function
Noor F.A.a, Sahdan M.F.a, Achmari P.a, Iskandar F.a, Abdullah M.a, Khairurrijala
a Physics of Electronic Materials Research, Division Faculty of Mathematics and Natural Sciences, Institut Teknologi Bandung, Indonesia
[vc_row][vc_column][vc_row_inner][vc_column_inner][vc_separator css=”.vc_custom_1624529070653{padding-top: 30px !important;padding-bottom: 30px !important;}”][/vc_column_inner][/vc_row_inner][vc_row_inner layout=”boxed”][vc_column_inner width=”3/4″ css=”.vc_custom_1624695412187{border-right-width: 1px !important;border-right-color: #dddddd !important;border-right-style: solid !important;border-radius: 1px !important;}”][vc_empty_space][megatron_heading title=”Abstract” size=”size-sm” text_align=”text-left”][vc_column_text]Electron transmittance and tunneling current through high-k dielectric gate stacks of metal-oxidesemiconductor (MOS) capacitors have been calculated by including transverse-longitudinal kinetic energy coupling, which is represented by a gate electron phase velocity, and anisotropic masses. Metal gate/HfSiOxN/SiO2/p-Si(100) structures with applying a negative bias voltage to the gate is used to discuss the transmittance and tunneling current. In this work, the effect of the work function to the transmittance and tunneling current are considered. It is shown that the transmittance decreases as the work function increases. It is also found that the tunneling current is influenced by the metal work function. © 2012 American Institute of Physics.[/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Author keywords” size=”size-sm” text_align=”text-left”][vc_column_text][/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Indexed keywords” size=”size-sm” text_align=”text-left”][vc_column_text]Anisotropic mass,High-k gate stack,Transmittance,Tunneling current,Work function[/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Funding details” size=”size-sm” text_align=”text-left”][vc_column_text][/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”DOI” size=”size-sm” text_align=”text-left”][vc_column_text]https://doi.org/10.1063/1.4730720[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text]Widget Plumx[/vc_column_text][/vc_column_inner][/vc_row_inner][/vc_column][/vc_row][vc_row][vc_column][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][/vc_column][/vc_row]