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Influence of film thickness on microstructural and electrical properties of copper oxide thin film prepared by magnetron sputtering
Sangwaranatee N.W.a, Sangwaranatee N.a, Horprathum M.b, Chananonnawathorn C.b, Sustini E.c
a Informatics Mathematics, Faculty of Science and Technology, Suan Sunandha Rajabhat University, Bangkok, 10300, Thailand
b Optical Thin-Film Laboratory, National Electronics and Computer Technology Center, Pathumthani, 12120, Thailand
c Faculty of Mathematics and Natural Sciences, Institut Teknologi Bandung, 40132, Indonesia
[vc_row][vc_column][vc_row_inner][vc_column_inner][vc_separator css=”.vc_custom_1624529070653{padding-top: 30px !important;padding-bottom: 30px !important;}”][/vc_column_inner][/vc_row_inner][vc_row_inner layout=”boxed”][vc_column_inner width=”3/4″ css=”.vc_custom_1624695412187{border-right-width: 1px !important;border-right-color: #dddddd !important;border-right-style: solid !important;border-radius: 1px !important;}”][vc_empty_space][megatron_heading title=”Abstract” size=”size-sm” text_align=”text-left”][vc_column_text]© 2018 Elsevier Ltd. All rights reserved.In this present work, the copper oxide (CuO) thin films were deposited by dc reactive magnetron sputtering on silicon (100) wafer. The microstructural evolution of the CuO thin films were investigated as a function of film thickness at the range of 150 to 600 nm by X-ray diffraction (XRD) and field-emission scanning electron microscopy (FE-SEM). The optical transmittance was measured by UV-VIS-NIR spectrophotometer. The sheet resistances of the CuO thin films were characterized by four-point-probe measurement. The results indicated that the obtained films were polycrystalline. The surface roughness of the CuO thin film showed an increasing with film thickness. In addition, the relationship between film thickness, morphology and electrical property were discussed in this paper.[/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Author keywords” size=”size-sm” text_align=”text-left”][vc_column_text][/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Indexed keywords” size=”size-sm” text_align=”text-left”][vc_column_text]CuO,Electrical property,Microstrural,Sputtering[/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Funding details” size=”size-sm” text_align=”text-left”][vc_column_text]This work was supported by Applied Physics, Faculty of Science and Technology, Suan Sunandha Rajabhat University and Faculty of Mathematics and Natural Sciences, Institut Teknologi Bandung, Indonesia. Authors were grateful to National Electronic and Computer Technology Center (NECTEC) for the instrumental support of the instrument of deposition and characterization systems.[/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”DOI” size=”size-sm” text_align=”text-left”][vc_column_text]https://doi.org/10.1016/j.matpr.2018.04.082[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text]Widget Plumx[/vc_column_text][/vc_column_inner][/vc_row_inner][/vc_column][/vc_row][vc_row][vc_column][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][/vc_column][/vc_row]