[vc_empty_space][vc_empty_space]
Influence of p-and n-type doping gases on nanoparticle formation in SiH4/H2 radiofrequency plasma discharges used for polymorphous silicon thin film deposition
Kharchenko A.V.c, Ouaras K., Suendo V.d, Ebothe J., Roca I Cabarrocas P.
a Laboratoire de Physique des Interfaces et des Couches Minces, LPICM, CNRS École Polytechnique, Université Paris-Saclay, Palaiseau, 91128, France
b Laboratoire de Recherche en Nanosciences (LRN), E.A. 4682, UFR Sciences Exactes, Université de Reims, Reims Cedex 02, 51685, France
c Saint-Gobain Research Paris, Aubervilliers, 93303, France
d Inorganic and Physical Chemistry Division, Faculty of Mathematics and Natural Sciences, Research Center for Nanosciences and Nanotechnology, Institut Teknologi Bandung, Bandung, 40132, Indonesia
[vc_row][vc_column][vc_row_inner][vc_column_inner][vc_separator css=”.vc_custom_1624529070653{padding-top: 30px !important;padding-bottom: 30px !important;}”][/vc_column_inner][/vc_row_inner][vc_row_inner layout=”boxed”][vc_column_inner width=”3/4″ css=”.vc_custom_1624695412187{border-right-width: 1px !important;border-right-color: #dddddd !important;border-right-style: solid !important;border-radius: 1px !important;}”][vc_empty_space][megatron_heading title=”Abstract” size=”size-sm” text_align=”text-left”][vc_column_text]© 2019 Author(s).We study the effect of the addition of p-or n-type doping gases, trimethylboron (TMB) or phosphine, respectively, on cluster formation in the SiH4/H2 plasma used for the deposition of hydrogenated polymorphous silicon thin films. The formation of clusters is monitored using time-resolved measurements of the second harmonic of the radio frequency current J2. We show that the addition of PH3 does not change the cluster formation, while the addition of a small amount of trimethylboron strongly affects its charging behavior, preventing to some extent its agglomeration. The most ordered pm-Si:H thin films are obtained under conditions from which not only clusters but also larger silicon agglomerates are formed in the plasma and contribute to the deposition. The inhibiting role of TMB on the agglomeration and powder formation is evidenced by the smoothness of p-type films at high rates, as deduced from the sample surface topography obtained by atomic force microscopy measurements.[/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Author keywords” size=”size-sm” text_align=”text-left”][vc_column_text]Cluster formations,Nanoparticle formation,Polymorphous silicon,Powder formation,Radio frequencies,Radio frequency plasma,Second harmonics,Time resolved measurement[/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Indexed keywords” size=”size-sm” text_align=”text-left”][vc_column_text][/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Funding details” size=”size-sm” text_align=”text-left”][vc_column_text][/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”DOI” size=”size-sm” text_align=”text-left”][vc_column_text]https://doi.org/10.1063/1.5090769[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text]Widget Plumx[/vc_column_text][/vc_column_inner][/vc_row_inner][/vc_column][/vc_row][vc_row][vc_column][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][/vc_column][/vc_row]