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Influence of annealing treatment on electric polarization behaviour of zinc oxide films grown by low-power dc- unbalanced magnetron sputtering
Kurniawan R.a, Nurfani E.a, Muhammady S.a, Sutjahja I.M.a, Winata T.a, Darma Y.a
a Department of Physics, Institut Teknologi Bandung, Bandung, 40132, Indonesia
[vc_row][vc_column][vc_row_inner][vc_column_inner][vc_separator css=”.vc_custom_1624529070653{padding-top: 30px !important;padding-bottom: 30px !important;}”][/vc_column_inner][/vc_row_inner][vc_row_inner layout=”boxed”][vc_column_inner width=”3/4″ css=”.vc_custom_1624695412187{border-right-width: 1px !important;border-right-color: #dddddd !important;border-right-style: solid !important;border-radius: 1px !important;}”][vc_empty_space][megatron_heading title=”Abstract” size=”size-sm” text_align=”text-left”][vc_column_text]© Published under licence by IOP Publishing Ltd.We study the annealing effect of highly oriented zinc oxide (ZnO) films grown by low-power dc-unbalanced magnetron sputtering (DC-UBMS). In this study, we compare the structural and electrical properties of thermal-annealed ZnO films (ann-ZnO) and as-growth ZnO films (ag-ZnO) by using x-ray diffraction (XRD), scanning electron microscopy (SEM) and RT66A standardized ferroelectric test system. We found that the ag-ZnO films and the ann-ZnO films show a high orientation in (101) plane. SEM images indicate that annealing treatment at 600°C in nitrogen ambient promote the surface atomics arrangement and convert a non-uniform ag-ZnO surface to relatively flat ann-ZnO film surface. Also confirm that the ag- ZnO and the ann-ZnO films have strong ferroelectric characteristics, while the values of remnant polarization and polarization saturation are almost similar. The electric coercivity (Ec ) of the ann-ZnO film is larger than ag-ZnO films as an indication of structural defects elimination. Our results are beneficial for high energy electric-based storage devices with less depolarized structural systems.[/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Author keywords” size=”size-sm” text_align=”text-left”][vc_column_text]Annealing treatments,Electric polarization,Ferroelectric characteristics,Ferroelectric test systems,Remnant polarizations,Structural and electrical properties,Structural systems,Unbalanced magnetron sputtering[/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Indexed keywords” size=”size-sm” text_align=”text-left”][vc_column_text][/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Funding details” size=”size-sm” text_align=”text-left”][vc_column_text][/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”DOI” size=”size-sm” text_align=”text-left”][vc_column_text]https://doi.org/10.1088/1742-6596/776/1/012043[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text]Widget Plumx[/vc_column_text][/vc_column_inner][/vc_row_inner][/vc_column][/vc_row][vc_row][vc_column][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][/vc_column][/vc_row]