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Parallel-perpendicular kinetic energy coupling effect on electron tunneling currents in Al/HfO2/p-Ge and Al/SiO2/p-Si MOS diodes with nanometer-thick oxides
Hasanah L.a, Murakami H.b, Khairurrijalc, Miyazaki S.d
a Department of Physics Education, Faculty of Mathematics and Natural Sciences Education, Indonesia University of Education (UPI), Indonesia
b Graduate School of Advanced Sciences of Matter, Hiroshima University, Japan
c Physics of Electronic Materials Research Division, Faculty of Mathematics and Natural Sciences, Institut Teknologi Bandung, Indonesia
d Graduate School of Electrical Engineering and Computer Science, Nagoya University, Japan
[vc_row][vc_column][vc_row_inner][vc_column_inner][vc_separator css=”.vc_custom_1624529070653{padding-top: 30px !important;padding-bottom: 30px !important;}”][/vc_column_inner][/vc_row_inner][vc_row_inner layout=”boxed”][vc_column_inner width=”3/4″ css=”.vc_custom_1624695412187{border-right-width: 1px !important;border-right-color: #dddddd !important;border-right-style: solid !important;border-radius: 1px !important;}”][vc_empty_space][megatron_heading title=”Abstract” size=”size-sm” text_align=”text-left”][vc_column_text]Electron tunneling in Al/SiO2/p-Si and Al/HfO2/p-Ge MOS diodes under inversion and accumulation conditions was studied by taking into account the coupling of parallel-perpendicular kinetic energy and Airy wavefunctions. The calculated results showed that the tunneling currents in the Ge-based MOS diode are considerably lower than those in the Si-based one. The HfO2/Ge structure could therefore replace the SiO2/Si one to avoid the significant leakage current in MOS devices. © 2010 American Institute of Physics.[/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Author keywords” size=”size-sm” text_align=”text-left”][vc_column_text][/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Indexed keywords” size=”size-sm” text_align=”text-left”][vc_column_text]Electron velocity,leakage current,nanometer-thick oxide,tunneling current[/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”Funding details” size=”size-sm” text_align=”text-left”][vc_column_text][/vc_column_text][vc_empty_space][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][vc_empty_space][megatron_heading title=”DOI” size=”size-sm” text_align=”text-left”][vc_column_text]https://doi.org/10.1063/1.3515556[/vc_column_text][/vc_column_inner][vc_column_inner width=”1/4″][vc_column_text]Widget Plumx[/vc_column_text][/vc_column_inner][/vc_row_inner][/vc_column][/vc_row][vc_row][vc_column][vc_separator css=”.vc_custom_1624528584150{padding-top: 25px !important;padding-bottom: 25px !important;}”][/vc_column][/vc_row]